AlixLabs offers nanostructure fabrication methods using the Atomic Layer Etching process. This method of nanostructure fabrication uses the Atomic Layer Etching process, which is a damage-free etch process. AlixLabs offers an ALE-based method for producing nanostructures with characteristic sizes less than 20 nm. AlixLabs' technology fabricates nanostructures beyond the resolution limit of optical and electron beam lithography, with applications in nanoelectronic device fabrication, for example. This invention, among other things, may enable an economically viable method of transistor channel scaling for sub-20 nm technology nodes.